UMS Foundry training methodologies for GaN and GaAs technologies

Course Objectives

The objective of this Foundry training is to equip attendees with the optimal methodologies for utilising UMS GaN and GaAs technologies for RF and mmWave MMIC applications.

This session will equip RF designers with the knowledge and skills to utilise the UMS PDKs effectively in circuit design.

The session will also address GaAs and GaN wafer fabrication in order to provide attendees with a deeper familiarity with III-V technologies. The important modelling topics are also addressed from both an electrical and thermal perspective. The content of our PDKs is also discussed, and demonstrations are provided with the support of Keysight and Cadence engineers.

Experienced UMS designers will deliver lectures on the following topics: LNA design, HPA design and mixer design(*). Examples are provided and discussed in detail.

The foundry flow, layout rules and specifications related to GaN are also addressed. A lecture is given on process qualification and the space level. All available back-end activities (on wafer test, dicing and picking) are discussed prior to a BE tour.

The training is completed with a discussion on different packaging solutions developed at UMS.

Joining a course

If you wish to attend  or need further information on foundry courses, please contact mktsales@ums-rf.com